Noh-Jung Kwak

EUV mask particle adders during scanner exposure

Sunyoung Koo, Chang-Moon Lim, Young-Sik Kim, 2015, Advanced Lithography.

Comparative study of DRAM cell patterning between ArF immersion and EUV lithography

Sunyoung Koo, Jun-Taek Park, Chang-Moon Lim, 2009, Advanced Lithography.

Applications of MoSi-based binary intensity mask for sub-40nm DRAM

Sunyoung Koo, Jun-Taek Park, Sung-Ki Park, 2010, Advanced Lithography.

Patterning challenges of EUV lithography for 1X-nm node DRAM and beyond

Sungki Park, Seung-Hyun Hwang, Tae-Seung Eom, 2013, Advanced Lithography.