Ryuichi Funatsu

X-Ray Exposure System With Plasma Source For Microlithography

Akira Inagaki, Yasuo Kato, Keiichi Okamoto, 1989, Advanced Lithography.

Focusing and leveling based on wafer surface profile detection with interferometry for optical lithography

Akira Fujii, Masahiro Watanabe, Yoshitada Oshida, 1994, Advanced Lithography.

Ultra precision wafer positioning by six-axis micro-motion mechanism

Akira Inagaki, Minoru Ikeda, Ryuichi Funatsu, 1990 .

Shot leveling and focusing with interferometry for optical lithography of sub-half-micron LSI

Yoshitada Oshida, Taku Ninomiya, Ryuichi Funatsu, 1993 .