Hee-Bom Kim

发表

Optical lithography simulation considering impact of mask errors

Chang-Nam Ahn, Hee-Bom Kim, Won-Kwang Ma, 2002, SPIE Advanced Lithography.

Application of actinic mask review system for the preparation of HVM EUV lithography with defect free mask

Hee-Bom Kim, Jihoon Na, Dong-gun Lee, 2017, Advanced Lithography.

Optical performance enhancement technique for 45-nm-node with binary mask

Woo-Sung Han, Sung-Woon Choi, Hee-Bom Kim, 2007, SPIE Advanced Lithography.

Computational approach on PEB process in EUV resist: multi-scale simulation

Maenghyo Cho, Hee-Bom Kim, Junghwan Moon, 2017, Advanced Lithography.

Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM

Ki Soo Shin, Seung-Chan Moon, Hee-Bom Kim, 2003, SPIE Advanced Lithography.

Double-exposure strategy using OPC and simulation and the performance on wafer with sub-0.10-μm design rule in ArF lithography

Chang-Nam Ahn, Hee-Bom Kim, Ki-Soo Shin, 2002, SPIE Advanced Lithography.

Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography

Chang-Nam Ahn, Seung-Weon Paek, Hee-Bom Kim, 2001, SPIE Photomask Technology.

Defect printability and specification of ArF mask in repeating feature

Hee-Bom Kim, Won-Kwang Ma, Wan-Ho Kim, 2002, SPIE Advanced Lithography.

Mask critical dimension error on optical lithography

Chang-Nam Ahn, Seung-Weon Paek, Hee-Bom Kim, 2000, Photomask Japan.

0.33-k1 ArF lithography for 100-nm DRAM

Chang-Nam Ahn, Cheol-Kyu Bok, Hee-Bom Kim, 2002, SPIE Advanced Lithography.

Application of full-chip level optical proximity correction to memory device with sub-0.10-μm design rule and ArF lithography

Chang-Nam Ahn, Hee-Bom Kim, Ki-Soo Shin, 2001, SPIE Advanced Lithography.

Development of high-transmittance phase-shifting mask for ArF immersion lithography

Hee-Bom Kim, Won-Suk Ahn, Hwan-Seok Seo, 2015, Other Conferences.

Phase-shifted assist feature OPC for sub-45-nm node optical lithography

Seong-Woon Choi, Woo-Sung Han, Hee-Bom Kim, 2007, SPIE Advanced Lithography.

A study on the ESD damage of a silicon oxy-nitride hard mask on the chromium surface of PSM blank

Hee-Bom Kim, Chan-Uk Jeon, In-kyun Shin, 2013, Photomask Technology.

Development and evaluation of new MRC parameter for aggressive mask optimization

Han-Ku Cho, Seong-Woon Choi, Sung-Woo Lee, 2009, Lithography Asia.

Theoretical modeling of PEB procedure on EUV resist using FDM formulation

Maenghyo Cho, Hee-Bom Kim, Junghwan Moon, 2018, Advanced Lithography.

Exposure latitude analysis for dense line and space patterns by using diffused aerial image model

Chang-Nam Ahn, Hee-Bom Kim, Ki Ho Baik, 2000, Advanced Lithography.

Validation of repair process for DUV attenuated phase-shift mask

Chang-Nam Ahn, Seung-Weon Paek, Hee-Bom Kim, 2000, Advanced Lithography.

Accuracy of diffused aerial image model for full-chip-level optical proximity correction

Chang-Nam Ahn, Hee-Bom Kim, Ki Ho Baik, 2000, Advanced Lithography.

Inorganic resist materials based on zirconium phosphonate for atomic force microscope lithography

In-kyun Shin, Hee-Bom Kim, Chan-Uk Jeon, 2014, Advanced Lithography.

Scatterometry based profile metrology of two-dimensional patterns of EUV masks

Han-Ku Cho, Hee-Bom Kim, Byung-Gook Kim, 2007, Photomask Japan.

Optical performance enhancement technique for 45-nm node with binary mask

Han-Ku Cho, Sang-Gyun Woo, Hee-Bom Kim, 2007, Photomask Japan.

Study of nanometer-thick graphite film for high-power EUVL pellicle

Soo-Young Kim, Ji-Beom Yoo, Hee-Bom Kim, 2016, SPIE Advanced Lithography.

Rigorous modeling and analysis of impact produced by microstructures in mask on wafer pattern fidelity

Han-Ku Cho, Hee-Bom Kim, Byung-Gook Kim, 2008, SPIE Advanced Lithography.

Practical implementation of alternating PSM to memory device of sub-0.25-um technology

Ki-Ho Baik, Chang-Nam Ahn, Hee-Bom Kim, 1996, Advanced Lithography.

Novel approximate model for resist process

Ki-Ho Baik, Chang-Nam Ahn, Hee-Bom Kim, 1998, Advanced Lithography.

EUV mask readiness for HVM (Conference Presentation)

Hee-Bom Kim, Dong-gun Lee, Hwan-Seok Seo, 2017 .

Optical Proximity Correction Using Diffused Aerial Image Model

Ki-Ho Baik, Chang-Nam Ahn, Hee-Bom Kim, 1999 .

Study on the potentialities of sub-100nm optical lithography of alternating and phase-edge phase shift mask for ArF lithography

Chang-Nam Ahn, Seung-Weon Paek, Hee-Bom Kim, 2001 .

Influence of a non-ideal sidewall angle of extreme ultra-violet mask absorber for 1 ×-nm patterning in isomorphic and anamorphic lithography

Hye-Keun Oh, Hee-Bom Kim, Chan-Uk Jeon, 2017 .