Ki-Soo Shin

发表

Optical lithography simulation considering impact of mask errors

Chang-Nam Ahn, Hee-Bom Kim, Won-Kwang Ma, 2002, SPIE Advanced Lithography.

100 nm device fabrication using ArF resist

Jae Chang Jung, Ki-Soo Shin, Sung-Koo Lee, 2002, SPIE Advanced Lithography.

Impact of ArF attenuated PSM using multishifter layer (TiN/Si3N4) for next-generation lithography

Seung-Weon Paek, Ki-Soo Shin, Cheol Shin, 2001, Photomask Japan.

Rinse liquid to improve pattern collapse behavior

Cheol-Kyu Bok, Seung-Chan Moon, Ki-Soo Shin, 2003, SPIE Advanced Lithography.

Impact on wafer process of sub-120-nm design rule mask

Won-Kwang Ma, Ki-Soo Shin, Sang-Sool Koo, 2002, SPIE Photomask Technology.

Macrocycle monomer having ethyleneoxy unit to buffer acid diffusion (new base for photoresist)

Jae Chang Jung, Deog-Bae Kim, Jae-Hyun Kim, 2002, SPIE Advanced Lithography.

Characterization and improvement of resist pattern collapse on ArF (193 nm) organic B.A.R.C.

Jae Chang Jung, Shuji Ding, Mark Neisser, 2002, SPIE Advanced Lithography.

Gate Oxide Degradation during Polysilicon Etching in a Parallel Plate Plasma Type Etcher

Ki-Soo Shin, Dong-Duk Lee, Jeong-Ho Kim, 1995 .

Double-exposure strategy using OPC and simulation and the performance on wafer with sub-0.10-μm design rule in ArF lithography

Chang-Nam Ahn, Hee-Bom Kim, Ki-Soo Shin, 2002, SPIE Advanced Lithography.

Feasibility study on the ArF attenuated phase-shift mask for 100-nm node lithography

Chang-Nam Ahn, Seung-Weon Paek, Ki-Soo Shin, 2001, SPIE Advanced Lithography.

Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists

Sang-Ho Lee, Munirathna Padmanaban, Woo-Kyu Kim, 2002, SPIE Advanced Lithography.

Polarity effects of polymer on the 193-nm resist performance

Cheol-Kyu Bok, Jae-Hyun Kim, Ki-Soo Shin, 2003, SPIE Advanced Lithography.

Feasibility study of printing sub-100-nm with ArF lithography

Cheol-Kyu Bok, Ki-Soo Shin, Yoonsuk Hyun, 2001, SPIE Advanced Lithography.

Novel chemically amplified positive resist containing acetal-type crosslinker of poly(3,3'-dimethoxypropene) for 193-nm top surface imaging process

Jin Soo Kim, Jae Chang Jung, Ki-Soo Shin, 2001, SPIE Advanced Lithography.

0.33-k1 ArF lithography for 100-nm DRAM

Chang-Nam Ahn, Cheol-Kyu Bok, Hee-Bom Kim, 2002, SPIE Advanced Lithography.

Application of full-chip level optical proximity correction to memory device with sub-0.10-μm design rule and ArF lithography

Chang-Nam Ahn, Hee-Bom Kim, Ki-Soo Shin, 2001, SPIE Advanced Lithography.

Amine gradient process for 157-nm lithography

Jae Chang Jung, Ki-Soo Shin, Sung-Koo Lee, 2002, SPIE Advanced Lithography.

Surface charging effect on microloading for sub-quarter-micron contact etching

Ki-Soo Shin, Hae-Sung Park, Soo Han Choi, 1994, Advanced Lithography.

A Key Distribution and Authentication Scheme based on X.25 Protocol

Ki-Soo Shin, Kiwook Sohn, Eungki Park, 1997 .

Comparison study on mask error factor in 100-nm ArF and KrF lithography

Cheol-Kyu Bok, Ki-Soo Shin, Tae-Seung Eom, 2001, SPIE Advanced Lithography.

Novel routes toward sub-70-nm contact windows by using new KrF photoresist

Jae Chang Jung, Ki-Soo Shin, Geunsu Lee, 2001, SPIE Advanced Lithography.

Intrafield CD variation by stray light from neighboring field

Chang-Moon Lim, Chang-Nam Ahn, Ki-Soo Shin, 2002, SPIE Advanced Lithography.

CD metrology for avoiding shrinkage of ArF resist patterns in 100 nm ArF lithography

Cheol-Kyu Bok, Ki-Soo Shin, Tae-Jun You, 2002, SPIE Advanced Lithography.

Minimization of DUV multi-interference effect in 0.25-μm device fabrication

Daehee Kim, Seung-Chan Moon, Ki-Soo Shin, 1997, Advanced Lithography.

Printing 100-nm and sub-100-nm DRAM full-chip patterns with crosspole illumination in 0.63-NA ArF lithography

Cheol-Kyu Bok, Ki-Soo Shin, Seok-Kyun Kim, 2002, SPIE Advanced Lithography.

Effects of process parameters on microloading in subhalf-micron aluminum etching

Daehee Kim, Ki-Soo Shin, Jongweon Youn, 1996, Advanced Lithography.

Quantitative analysis of mask error effect on wafer CD variation in ArF lithography

Chang-Nam Ahn, Ki-Soo Shin, Sang-Sool Koo, 2001, Photomask Japan.

New approach for 193-nm resist using modified cycloolefin resin

Hyun Pyo Jeon, Joo Hyeon Park, Jae Chang Jung, 2002, SPIE Advanced Lithography.

Contact hole resolution enhancement by post exposure amine treatment (CONPEAT) process

Cheol-Kyu Bok, Jae Chang Jung, Ki-Soo Shin, 2002, SPIE Advanced Lithography.

Contact hole patterning performance of ArF resist for 0.10 μm technology node

Jae Chang Jung, Ki-Soo Shin, Sung-Koo Lee, 2002, SPIE Advanced Lithography.

Novel high-performance ArF resist for sub-100-nm lithography

Jae Chang Jung, Yang-Sook Kim, Deog-Bae Kim, 2001, SPIE Advanced Lithography.