Toshikazu Segawa

Performance of positive-tone chemically amplified resists for next-generation photomask fabrication

Naoya Hayashi, Hisatake Sano, Shiho Sasaki, 1997, Photomask Technology.

Performance of a chemically amplified positive resist for next-generation photomask fabrication

Naoya Hayashi, Hisatake Sano, Masaaki Kurihara, 1998, Photomask and Next Generation Lithography Mask Technology.

Electron beam lithography process for advanced optical masks

Naoya Hayashi, Toshifumi Yokoyama, Tsukasa Abe, 1998 .