E. Mastromatteo

Demonstration of an extendable and industrial 300mm BEOL integration for the 65-nm technology node

D. Reber, A. Farcy, C. Cregut, 2004, IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004..

Single-wafer/mini-batch approach for fast cycle time in advanced 300-mm fab

D. Mercier, E. Mastromatteo, O. Bonnin, 2003 .