O. Toublan

发表

Development of Eectrilcal On-Mask CD Test Structures Based on Optical Metrology Features

J.T.M. Stevenson, S. Smith, A. Tsiamis, 2007, 2007 IEEE International Conference on Microelectronic Test Structures.

Investigation of electrical and optical CD measurement techniques for the characterisation of on-mask GHOST proximity corrected features

J.T.M. Stevenson, S. Smith, A. Tsiamis, 2008, 2008 IEEE International Conference on Microelectronic Test Structures.

RET and DFM techniques for sub 30nm

V. Farys, A. Villaret, F. Robert, 2012, Advanced Lithography.

Reduce or eliminate line-end shortening and iso/dense bias by tuning NA, Sigma

O. Toublan, P. Schiavone, 1998 .

Determination Of The CD Dispersion And Proximity Bias Across The Lens Field By Electrical Linewidth Measurements

P. Schiavone, O. Toublan, D. Boutin, 1998, Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135).