Paul Mirkarimi

Ion beam deposition for defect-free EUVL mask blanks

Patrick Kearney, Takashi Sugiyama, Eberhard Spiller, 2009, European Mask and Lithography Conference.

Defect mitigation and reduction in EUVL mask blanks

Andy Ma, Patrick Kearney, Eberhard Spiller, 2007, SPIE Advanced Lithography.

Aperiodic x-ray multilayer interference coatings with high reflectance and large field of view

Regina Soufli, Stefan P. Hau-Riege, Jennifer Alameda, 2018, Optical Systems Design.

Ion beam deposition for defect-free EUVL mask blanks

Patrick Kearney, Takashi Sugiyama, Eberhard Spiller, 2008, SPIE Advanced Lithography.

Employing a detailed compositional analysis to develop a low defect Mo/Si deposition tool and process for EUVL mask blanks

Toshiyuki Uno, Andy Ma, Eberhard Spiller, 2006 .

Repairing amplitude defects in multilayer-coated extreme-ultraviolet lithography reticles by use of a focused ion beam.

Anton Barty, Miles Clift, Eric Gullikson, 2004, Applied optics.