Edward D. Babich

Multilayer Resist Systems Using Polysiloxanes As Etch Masks

Michael Hatzakis, Jurij R. Paraszczak, J. Shaw, 1983, Advanced Lithography.

New family of non-chemically amplified resists

Inna V. Babich, Marie Angelopoulos, Karen Petrillo, 1998, Advanced Lithography.

Chemical And Physical Aspects Of Multilayer Resist Processing

Michael Hatzakis, J. Heidenreich, Jurij R. Paraszczak, 1988, Advanced Lithography.

Optical properties of hydrogenated amorphous-carbon film for attenuated phase-shift mask applications

Sampath Purushothaman, Jane M. Shaw, Alessandro C. Callegari, 1993 .

Fabrication and performance studies of multilayer polymer/metal interconnect structures for packaging applications

Donald C. Hofer, Gerard V. Kopcsay, Alina Deutsch, 1991, 1991 Proceedings 41st Electronic Components & Technology Conference.

A simple bilayer lift-off process

Michael Hatzakis, Kevin J. Stewart, Jurij R. Paraszczak, 1990 .