Hans L. Huber

Alignment accuracy improvement by consideration of wafer processing impacts

Klaus Simon, H.-U. Scheunemann, Hans L. Huber, 1994, Advanced Lithography.

Impact of chuck flatness on wafer distortion and stepper overlay

Klaus Simon, H.-U. Scheunemann, Hans L. Huber, 1993, Advanced Lithography.

Fabrication of 0.5 µm MOS Test Devices by Application of X-ray Lithography at All Levels

Hans L. Huber, W. Windbracke, D. Friedrich, 1989, Advanced Lithography.

Alignment and overlay accuracy of an advanced x-ray stepper using an improved alignment system (Poster Paper)

Klaus Simon, H.-U. Scheunemann, Hans L. Huber, 1992, Advanced Lithography.

Modeling of illumination effects on resist profiles in x-ray lithography

Hans L. Huber, M. Weiss, Juan R. Maldonado, 1991, Other Conferences.