Idriss Blakey

发表

Systematic investigation of the synthesis, characterization and switching mechanism of metal oxide nanoparticle resists

James W. Thackeray, Ke Du, Peter Trefonas, 2016, SPIE Advanced Lithography.

Development of polymers for non-CAR resists for EUV lithography

Andrew K. Whittaker, Idriss Blakey, Michael J. Leeson, 2009, Advanced Lithography.

SERS-barcoded colloidal gold NP assemblies as imaging agents for use in biodiagnostics

Idriss Blakey, Peter M. Fredericks, Priyanka Dey, 2014, Photonics West - Biomedical Optics.

Synthesis of high refractive index sulfur containing polymers for 193 nm immersion lithography: a progress report

Andrew K. Whittaker, Idriss Blakey, Will Conley, 2006, SPIE Advanced Lithography.

EUVL compatible LER solutions using functional block copolymers

Andrew K. Whittaker, Idriss Blakey, Michael J. Leeson, 2012, Advanced Lithography.

Can ionic liquid additives be used to extend the scope of poly(styrene)-block-poly(methyl methacrylate) for directed self-assembly?

Idriss Blakey, Kristofer J. Thurecht, Kevin Pei, 2014 .

Non-chemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance

Warren Montgomery, Bruce W. Smith, Paul Zimmerman, 2010, Advanced Lithography.

Embedded top-coat for reducing the effect out of band radiation in EUV lithography

Ke Du, Peter Trefonas, Meiliana Siauw, 2017, Advanced Lithography.

Novel high-index resists for 193-nm immersion lithography and beyond

Will Conley, Lan Chen, Alvina M. Williams, 2007, SPIE Advanced Lithography.

Sensitive polysulfone based chain scissioning resists for 193nm lithography

Warren Montgomery, Neal Lafferty, Bruce W. Smith, 2011, Advanced Lithography.

Diagnostic prospects and preclinical development of optical technologies using gold nanostructure contrast agents to boost endogenous tissue contrast

Idriss Blakey, Nicholas Stone, Priyanka Dey, 2020, Chemical science.

Healing LER using directed self assembly: treatment of EUVL resists with aqueous solutions of block copolymers

Andrew K. Whittaker, Idriss Blakey, Kevin S. Jack, 2013, Advanced Lithography.

SANS of four-layer polyelectroyte nanoparticles assembled using layer-by-layer deposition

Andrew K. Whittaker, Idriss Blakey, Tara L. Schiller, 2006 .

Extending the scope of poly(styrene)-block-poly(methyl methacrylate) for directed self-assembly

Idriss Blakey, Kristofer J. Thurecht, Kevin Pei, 2014, Advanced Lithography.

Electron beam induced freezing of positive tone, EUV resists for directed self assembly applications

Andrew K. Whittaker, Idriss Blakey, Michael J. Leeson, 2011, Advanced Lithography.

Polycarbonate based nonchemically amplified photoresists for extreme ultraviolet lithography

Andrew K. Whittaker, Idriss Blakey, Wang Yueh, 2010, Advanced Lithography.

Effect of nanoholes on the plasmonic properties of star nanostructures

Andrew K. Whittaker, Idriss Blakey, Shaoli Zhu, 2011, Other Conferences.

High-RI resist polymers for 193 nm immersion lithography

Will Conley, Andrew K. Whittaker, Idriss Blakey, 2005, SPIE Advanced Lithography.

Non-CA resists for 193 nm immersion lithography: effects of chemical structure on sensitivity

Paul Zimmerman, Lan Chen, Andrew K. Whittaker, 2009, Advanced Lithography.

Development of an operational high refractive index resist for 193nm immersion lithography

Bryan J. Rice, Paul Zimmerman, Christopher K. Ober, 2008, SPIE Advanced Lithography.

The rational design of polymeric EUV resist materials by QSPR modelling

Andrew K. Whittaker, Idriss Blakey, Wang Yueh, 2007, SPIE Advanced Lithography.

Spatial arrangement of block copolymer nanopatterns using photoactive homopolymer substrates

Peter Trefonas, Andrew K. Whittaker, Idriss Blakey, 2021, Advanced Lithography.

XPS and 19F NMR Study of the Photodegradation at 157 nm of Photolithographic-Grade Teflon AF Thin Films

Andrew K. Whittaker, Idriss Blakey, Heping Liu, 2005 .

Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers

Ivan Pollentier, Andrew K. Whittaker, Idriss Blakey, 2011 .

Effect of Multimodal Plasmon Resonances on the Optical Properties of Five-Pointed Nanostars

Idriss Blakey, Shaoli Zhu, Michael B. Cortie, 2015 .

Control through monomer placement of surface properties and morphology of fluoromethacrylate copolymers

Andrew K. Whittaker, Idriss Blakey, Kevin S. Jack, 2015 .

Multimodal polymer nanoparticles with combined 19F magnetic resonance and optical detection for tunable, targeted, multimodal imaging in vivo.

Idriss Blakey, Kristofer J Thurecht, Cameron Alexander, 2014, Journal of the American Chemical Society.

Plasmonic 'top-hat' nano-star arrays by electron beam lithography

Idriss Blakey, Shaoli Zhu, Michael B. Cortie, 2015 .

Mechanism of 157 nm Photodegradation of Poly[4,5-difluoro-2,2-bis(trifluoromethyl)-1,3-dioxole-co-tetrafluoroethylene] (Teflon AF)

Andrew K. Whittaker, Idriss Blakey, Heping Liu, 2007 .

Patterning of tailored polycarbonate based non-chemically amplified resists using extreme ultraviolet lithography.

Idriss Blakey, Heping Liu, Anguang Yu, 2010, Macromolecular rapid communications.

Biomimetic surface modification of honeycomb films via a "grafting from" approach.

Anders Hult, Idriss Blakey, Daniel Nyström, 2010, Langmuir : the ACS journal of surfaces and colloids.

Aqueous developable dual switching photoresists for nanolithography

Warren Montgomery, Bruce W. Smith, Andrew K. Whittaker, 2012 .

Status of High-Index Materials for Generation-Three 193nm Immersion Lithography

Paul Zimmerman, Bryan J. Rice, Jeff D. Byers, 2007 .

Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists

Ivan Pollentier, Andrew K. Whittaker, Idriss Blakey, 2011 .