Kazuhiro Yamashita

Quarter Micron KrF Excimer Laser Lithography (Special Issue on Sub-Half Micron Si Device and Process Technologies)

Takahiro Matsuo, Masaru Sasago, Noboru Nomura, 1993 .

Heterodyne holographic nanometer alignment for a half-micron wafer stepper

Noboru Nomura, Masaki Suzuki, Keiji Kubo, 1990, Advanced Lithography.

Computer Aided Proximity Effect Correction System in Photolithography : Lithography Technology

Akio Misaka, Noboru Nomura, Kenji Harafuji, 1989 .

New Evaluation Method of Resist Coating Using Heterodyne Holographic Wafer Alignment.

Noboru Nomura, Kazuhiro Yamashita, 1994 .

Performance of 0.2 μm optical lithography using KrF and ArF excimer laser sources

Masaru Sasago, Noboru Nomura, Masayuki Endo, 1993 .