Pamela K. Barr

Lithographic characterization of improved projection optics in the EUVL engineering test stand

Patrick P. Naulleau, Henry N. Chapman, Sang Hun Lee, 2003, SPIE Advanced Lithography.

System and process learning in a full-field, high-power EUVL alpha tool

Kenneth A. Goldberg, Eric M. Gullikson, Patrick P. Naulleau, 2003, SPIE Advanced Lithography.

Understanding communication in counterterrorism crisis management.

Heidi R. Ammerlahn, Michael Lewis Bernard, Timothy J. Sa, 2004 .

Recent advances in the Sandia EUV 10x microstepper

Richard H. Stulen, Avijit K. Ray-Chaudhuri, Rodney P. Nissen, 1998, Advanced Lithography.

Some Limitations to the Spherical Flame Assumption Used in Phenomenological Engine Models

Pamela K. Barr, P. K. Barr, P. Witze, 1988 .