Akinori Saeki

发表

Difference between initial distributions of proton and counter anion in chemically amplified electron-beam resist

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2006, SPIE Advanced Lithography.

Dynamics of radical cation of poly(4-hydroxystyrene) generated in thin film upon exposure to electron beam

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2010, Advanced Lithography.

Monte Carlo simulation on line edge roughness after development in chemically amplified resist of post-optical lithography

Takahiro Kozawa, Seiichi Tagawa, Heidi B. Cao, 2008, SPIE Advanced Lithography.

Relation between spatial resolution and reaction mechanism of chemically amplified resists for electron beam lithography

Takahiro Kozawa, Seiichi Tagawa, Yoichi Yoshida, 2003 .

Enhancing photovoltaic performance by tuning the domain sizes of a small-molecule acceptor by side-chain-engineered polymer donors

Yang Yang, Dong Meng, Akinori Saeki, 2019, Journal of Materials Chemistry A.

Computer-Aided Screening of Conjugated Polymers for Organic Solar Cell: Classification by Random Forest.

Shinji Nagasawa, Akinori Saeki, A. Saeki, 2018, The journal of physical chemistry letters.

Pulse radiolysis study of radical cations of polysilanes

Seiichi Tagawa, Kazumasa Okamoto, Shu Seki, 2003 .

Reaction mechanism of fluorinated chemically amplified resists

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2006 .

Solution phase epitaxial self-assembly and high charge-carrier mobility nanofibers of semiconducting molecular gelators.

Shu Seki, Akinori Saeki, Ayyappanpillai Ajayaghosh, 2010, Journal of the American Chemical Society.

Formation and decay of fluorobenzene radical anions affected by their isomeric structures and the number of fluorine atoms.

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2010, The journal of physical chemistry. A.

Improved understanding of the electronic and energetic landscapes of perovskite solar cells: high local charge carrier mobility, reduced recombination, and extremely shallow traps.

Shuzi Hayase, Yuhei Ogomi, Shu Seki, 2014, Journal of the American Chemical Society.

Line edge roughness after development in a positive-tone chemically amplified resist of post-optical lithography investigated by Monte Carlo simulation and a dissolution model.

Takahiro Kozawa, Seiichi Tagawa, Hai Deng, 2008, Nanotechnology.

Difference of Spur Distribution in Chemically Amplified Resists upon Exposure to Electron Beam and Extreme Ultraviolet Radiation

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2009 .

Correlation betweenC37Parameters and Acid Yields in Chemically Amplified Resists upon Exposure to 75 keV Electron Beam

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2009 .

High-rate charge-carrier transport in porphyrin covalent organic frameworks: switching from hole to electron to ambipolar conduction.

Stephan Irle, Donglin Jiang, Shu Seki, 2012, Angewandte Chemie.

Relationship between Resolution, Line Edge Roughness, and Sensitivity in Chemically Amplified Resist of Post-Optical Lithography Revealed by Monte Carlo and Dissolution Simulations

Takahiro Kozawa, Seiichi Tagawa, Akinori Saeki, 2009 .

Block-copolymer-nanowires with nanosized domain segregation and high charge mobilities as stacked p/n heterojunction arrays for repeatable photocurrent switching.

Katsuhiko Ariga, Meiyong Liao, Shu Seki, 2009, Journal of the American Chemical Society.

Radiation Chemistry of Fluoronaphthalene as a Candidate for Absorption Enhancement Component of Chemically Amplified Extreme Ultraviolet Resists

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2010 .

Dynamics of photogenerated charge carrier and morphology dependence in polythiophene films studied by in situ time-resolved microwave conductivity and transient absorption spectroscopy

Seiichi Tagawa, Shu Seki, Akinori Saeki, 2007 .

Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists for Extreme Ultraviolet Lithography

Takahiro Kozawa, Seiichi Tagawa, Akinori Saeki, 2008 .

Electrodeless measurement of charge carrier mobility in pentacene by microwave and optical spectroscopy techniques

Seiichi Tagawa, Shu Seki, Akinori Saeki, 2006 .

Analysis of acid yield generated in chemically amplified electron beam resist

Takahiro Kozawa, Seiichi Tagawa, Kazumasa Okamoto, 2006 .

Proton and anion distribution and line edge roughness of chemically amplified electron beam resist

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, 2005 .

Quantum Spin Hall Effect and Topological Phase Transition in HgTe Quantum

Masateru Taniguchi, Tomoji Kawai, Seiichi Tagawa, 2022 .

Exposure dose dependence on line edge roughness of a latent image in electron beam/extreme ultraviolet lithographies studied by Monte Carlo technique

Takahiro Kozawa, Seiichi Tagawa, Heidi B. Cao, 2007 .

Reactivity between biphenyl and precursor of solvated electrons in tetrahydrofuran measured by picosecond pulse radiolysis in near-ultraviolet, visible, and infrared.

Takahiro Kozawa, Seiichi Tagawa, Akinori Saeki, 2007, The journal of physical chemistry. A.

Correlation between proton dynamics and line edge roughness in chemically amplified resist for post-optical lithography

Takahiro Kozawa, Seiichi Tagawa, Heidi B. Cao, 2006 .

Study of the Reaction of Acid Generators with Epithermal and Thermalized Electrons

Takahiro Kozawa, Seiichi Tagawa, Tsutomu Shimokawa, 2008 .