Guillaume Boccardi

Tackling CMP challenges related to the integration of III-V materials for <10nm node applications

Niamh Waldron, Patrick Ong, Lieve Teugels, 2015 .

(Invited) Replacement Metal Gate/High-k Last Technology for Aggressively Scaled Planar and FinFET-Based Devices

Naoto Horiguchi, Eddy Simoen, Anabela Veloso, 2014 .

Gate double patterning strategies for 10-nm node FinFET devices

David Hellin, Hubert Hody, Vasile Paraschiv, 2015 .

Stress Techniques and Mobility Enhancement in FinFET Architectures

Naoto Horiguchi, Geert Hellings, Anabela Veloso, 2013 .

Gate double patterning strategies for 10nm node FinFET devices

David Hellin, Hubert Hody, Vasile Paraschiv, 2014, Advanced Lithography.

Plasma doping and reduced crystalline damage for conformally doped fin field effect transistors

Naoto Horiguchi, Aaron Thean, Guido Groeseneken, 2013 .