Klaus Boehm

A–Z Study Areas

Klaus Boehm, Nick Wellings, 1979 .

Aerial image measuring system at 193 nm: a tool-to-tool comparison and global CD mapping

Rainer Schmid, Axel M. Zibold, Robert Birkner, 2004, SPIE Photomask Technology.

Actinic aerial image measurement for qualification of defect on 157-nm photomask

Wolfgang Degel, Iwao Higashikawa, Axel M. Zibold, 2004, Photomask Japan.