Eiji Nishimura

A control system for an engine

Koichi Hatamura, Eiji Nishimura, Takahisa Ishihara, 2001 .

Proximity effect reduction in high voltage electron‐beam lithography by bias exposure method

T. Takigawa, Eiji Nishimura, T. Abe, 1986 .

Main-Field Stitching Accuracy Analysis in Electron Beam Writing Systems

Hirohito Anze, Shuichi Tamamushi, Tadahiro Takigawa, 1992 .

A high accuracy and high throughput electron beam reticle writing system for 16M dynamic random access memory class and beyond devices

Osamu Ikenaga, Fumiaki Shigemitsu, Hirohito Anze, 1990 .