Huirong Yao

发表

EUV underlayer materials for 22nm HP and beyond

Jianhui Shan, Mark Neisser, Guanyang Lin, 2011, Advanced Lithography.

A chemical underlayer approach to mitigate shot noise in EUV contact hole patterning

Yi Cao, Munirathna Padmanaban, Takanori Kudo, 2014, Advanced Lithography.

Bottom anti-reflective coating for hyper NA process: theory, application and material development

Mark Neisser, Ralph R. Dammel, Guanyang Lin, 2008, Lithography Asia.

Underlayer and rinse materials for improving EUV resist performance

Munirathna Padmanaban, Takanori Kudo, Jin Li, 2013, Advanced Lithography.

High-etch-rate low-bias bow outgassing BARC via-filling materials for 193-nm ArF lithographic process

Jianhui Shan, Mark Neisser, Guanyang Lin, 2008, SPIE Advanced Lithography.

Novel spin-on metal hardmask materials for filling applications

Edward Ng, Munirathna Padmanaban, Alberto D. Dioses, 2014, Advanced Lithography.

New spin-on metal hardmask materials for lithography processes

Munirathna Padmanaban, Dalil Rahman, Clement Anyadiegwu, 2013, Advanced Lithography.

Ligand additivity in 47-electron clusters. Electrochemistry of (μ-H)Ru3(μ3-η 3-XCCRCR′)(CO)9-n(PPh3)n and reactions with electrophiles: One-electron oxidation and adduct formation

J. B. Keister, Robert D. Allendoerfer, Huirong Yao, 1998 .

Preparation of fluorescein-based chemosensors and their sensing behaviors toward silver ions

Yan Lu, Liancheng Zhao, Chang Liu, 2014 .

Reactions of electrophiles with ruthenium clusters (.mu.-H)Ru3(.mu.3-.eta.3-XCCRCR')(CO)9-n(PPh3)n: one-electron oxidation or adduct formation

Jerome B. Keister, Robert D. Allendoerfer, Huirong Yao, 1993 .

Structural studies on ruthenium carbonyl hydrides: XVIII. Synthesis and characterization of (μ-H)Ru3(μ3-η3-XCCRCR′)(CO)9—n(PPh3)n complexes. Crystal structures of (μ-H)Ru3(μ3-η3-Et2NCCHCMe)(CO)8(PPh3) and (μ-H)Ru3(μ3-η3-MeOCCMeCMe)(CO)7(PPh3)2·2CH2Cl2

Melvyn Rowen Churchill, Charles H. Lake, C. H. Lake, 1993 .