Keren Zhang

High temperature spin on carbon materials with excellent planarization and CVD compatibility

Li Cui, Lei Zhang, Iou-Sheng Ke, 2019, Advanced Lithography.

Design considerations for high etch resistance spin-on carbon underlayers

William Marshall, Lei Zhang, Iou-Sheng Ke, 2020, Advanced Lithography.

Planarized spin-on carbon hardmask

Sheng Liu, Iou-Sheng Ke, James F. Cameron, 2020, Advanced Lithography.