Kenneth A. Goldberg

发表

Photon flux requirements for EUV reticle imaging microscopy in the 22- and 16nm nodes

Daniel Wintz, Kenneth A. Goldberg, Iacopo Mochi, 2010, Advanced Lithography.

Replicated mask surface roughness effects on EUV lithographic patterning and line edge roughness

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2011, Advanced Lithography.

Calibration of EUV 2D photoresist simulation parameters for accurate predictive modeling

Kenneth A. Goldberg, Patrick P. Naulleau, Kevin McDonald, 2003, SPIE Advanced Lithography.

Characterization of the synchrotron-based 0.3-NA EUV microexposure tool at the ALS

Kenneth A. Goldberg, Patrick P. Naulleau, Erik H. Anderson, 2005 .

Commissioning a new EUV Fresnel zoneplate mask-imaging microscopefor lithography generations reaching 8 nm

Kenneth A. Goldberg, 2014 .

EUV engineering test stand

Kenneth A. Goldberg, Patrick P. Naulleau, Leonard E. Klebanoff, 2000, Advanced Lithography.

Broader view on extreme ultraviolet masks: adding complementary imaging modes to the SHARP microscope

Kenneth A. Goldberg, Antoine Wojdyla, Yow-Gwo Wang, 2015 .

Inspection 13.2-nm table-top full-field microscope

Kenneth A. Goldberg, Yong Wang, Patrick P. Naulleau, 2009, Advanced Lithography.

EUV mask reflectivity measurements with micron-scale spatial resolution

Kenneth A. Goldberg, Hakseung Han, Anton Barty, 2008, SPIE Advanced Lithography.

Modal wavefront reconstruction from its gradient

Kenneth A. Goldberg, Iacopo Mochi, 2015 .

Design optimization of bendable x-ray mirrors

Valeriy V. Yashchuk, Kenneth A. Goldberg, Wayne R. McKinney, 2011, Optical Engineering + Applications.

Determining the critical size of EUV mask substrate defects

Kenneth A. Goldberg, Hakseung Han, Eric M. Gullikson, 2008, SPIE Advanced Lithography.

A next-generation EUV Fresnel zoneplate mask-imaging microscope

Kenneth A. Goldberg, 2012 .

Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2016 .

Emulation of anamorphic imaging on the SHARP EUV mask microscope

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2016, SPIE Advanced Lithography.

Phase-enhanced defect sensitivity for EUV mask inspection

Kenneth A. Goldberg, Patrick P. Naulleau, Andrew R. Neureuther, 2014, Photomask Technology.

EUV resist imaging below 50 nm using coherent spatial filtering techniques

Kenneth A. Goldberg, Patrick P. Naulleau, Erik H. Anderson, 2004, SPIE Advanced Lithography.

A New Light for Berkeley Lab—the Advanced Light Source Upgrade

Kenneth A. Goldberg, Daniela Leitner, Christoph Steier, 2019, Synchrotron Radiation News.

Recent advances in EUV phase-shifting point diffraction interferometry

Kenneth A. Goldberg, Patrick P. Naulleau, Jeffrey Bokor, 1999, Optics & Photonics.

Printability study of pattern defects in the EUV mask as a function of hp nodes

Kenneth A. Goldberg, Iacopo Mochi, Sungmin Huh, 2012, Advanced Lithography.

Measurement of through-focus EUV pattern shifts using the SHARP actinic microscope

Kenneth A. Goldberg, Obert Wood, Pawitter Mangat, 2017, Photomask Technology.

Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry

Kenneth A. Goldberg, Jeffrey Bokor, Sang Hun Lee, 1997, Advanced Lithography.

An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm

Kenneth A. Goldberg, Iacopo Mochi, Patrick P. Naulleau, 2011, Advanced Lithography.

Using synchrotron light to accelerate EUV resist and mask materials learning

Kenneth A. Goldberg, Warren Montgomery, Iacopo Mochi, 2011, European Mask and Lithography Conference.

Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection

Kenneth A. Goldberg, Patrick P. Naulleau, Antoine Wojdyla, 2015, Advanced Lithography.

Resist evauation at 50 nm in the EUV using interferometric spatial-frequency-doubled imaging

Kenneth A. Goldberg, Patrick P. Naulleau, Jeffrey Bokor, 2003, SPIE Advanced Lithography.

Evaluating EUV mask pattern imaging with two EUV microscopes

Kenneth A. Goldberg, Hiroo Kinoshita, Hak-Seung Han, 2008 .

EUV mask multilayer defects and their printability under different multilayer deposition conditions

Kenneth A. Goldberg, Iacopo Mochi, Jenah Harris-Jones, 2012, Advanced Lithography.

Sub-100-nm lithographic imaging with an EUV 10X microstepper

Kenneth A. Goldberg, Jonathan L. Cobb, Patrick P. Naulleau, 1999, Advanced Lithography.

Collecting EUV mask images through focus by wavelength tuning

Kenneth A. Goldberg, Sungmin Huh, Iacopo Mochi, 2009, Advanced Lithography.

Extremely fine-pitch printing with a 10X Schwarzschild optic at extreme-ultraviolet wavelengths

Kenneth A. Goldberg, Patrick P. Naulleau, Jeffrey Bokor, 2001, SPIE Advanced Lithography.

Improving the performance of the actinic inspection tool with an optimized alignment procedure

Kenneth A. Goldberg, Sungmin Huh, Patrick P. Naulleau, 2009, Advanced Lithography.

EUV and non-EUV inspection of reticle defect repair sites

Kenneth A. Goldberg, Hakseung Han, Anton Barty, 2007, SPIE Advanced Lithography.

Static microfield printing at the Advanced Light Source with the ETS Set-2 optic

Pei-yang Yan, Richard H. Stulen, Donald W. Sweeney, 2002, SPIE Advanced Lithography.

Advanced extreme ultraviolet resist testing using the SEMATECH Berkeley 0.3-NA microfield exposure tool

Kenneth A. Goldberg, Sungmin Huh, Patrick P. Naulleau, 2008, SPIE Advanced Lithography.

Recovering effective amplitude and phase roughness of EUV masks

Kenneth A. Goldberg, Patrick P. Naulleau, Iacopo Mochi, 2013, Photomask Technology.

Positioning polygonal parts without sensors

Kenneth A. Goldberg, Murilo Coutinho, Amir H. Mottaez, 1993, Other Conferences.

Extreme ultraviolet mask roughness: requirements, characterization, and modeling

Kenneth A. Goldberg, Patrick P. Naulleau, Eric M. Gullikson, 2014, Photomask and Next Generation Lithography Mask Technology.

Increased depth of field through wave-front coding: using an off-axis zone plate lens with cubic phase modulation in an EUV microscope

Kenneth A. Goldberg, Iacopo Mochi, Markus P. Benk, 2013, Photomask Technology.

Static EUV micro-exposures using the ETS Set-2 optics

Kenneth A. Goldberg, Sherry L. Baker, Patrick P. Naulleau, 2003, SPIE Advanced Lithography.

A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope

Kenneth A. Goldberg, Antoine Wojdyla, Yow-Gwo Wang, 2014, Photomask Technology.

EUV focus sensor: design and modeling

Kenneth A. Goldberg, Maureen E. Teyssier, J. Alexander Liddle, 2005, SPIE Advanced Lithography.

Quantitative evaluation of mask phase defects from through-focus EUV aerial images

Kenneth A. Goldberg, Iacopo Mochi, Pei-Yang Yan, 2011, Advanced Lithography.

Performance upgrades in the EUV engineering test stand

Donald W. Sweeney, Kenneth A. Goldberg, Patrick P. Naulleau, 2002, SPIE Advanced Lithography.

Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach

Kenneth A. Goldberg, Iacopo Mochi, Thomas V. Pistor, 2015, Advanced Lithography.

EUV interferometric testing and alignment of the 0.3-NA MET optic

Kenneth A. Goldberg, Patrick P. Naulleau, Erik H. Anderson, 2004, SPIE Advanced Lithography.

Adding static printing capabilities to the EUV phase-shifting point diffraction interferometer

Kenneth A. Goldberg, Patrick P. Naulleau, Erik H. Anderson, 2001, SPIE Advanced Lithography.

Analysis of systematic errors in lateral shearing interferometry for EUV optical testing

Kenneth A. Goldberg, Patrick P. Naulleau, Ryan Miyakawa, 2009, Advanced Lithography.

EUV Research at Berkeley Lab: Enabling Technologies and Applications

Kenneth A. Goldberg, Patrick P. Naulleau, Peter Fischer, 2016 .

EUV holographic aerial image recording

Kenneth A. Goldberg, Patrick P. Naulleau, Jeffrey Bokor, 2000, Advanced Lithography.

Ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2016, Photomask Japan.

Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology

Kenneth A. Goldberg, Bruce W. Smith, Obert Wood, 2016 .

Design and demonstration of tunable soft x-ray lateral shearing and Hartmann wavefront sensors

Kenneth A. Goldberg, Antoine Wojdyla, Mourad Idir, 2018, Optical Engineering + Applications.

Actinic Mask Inspection at the ALS Initial Design Review

Donald W. Sweeney, Kenneth A. Goldberg, Anton Barty, 2003 .

Experimental methods for optimal tuning of bendable mirrors for diffraction-limited soft x-ray focusing

Valeriy V. Yashchuk, Kenneth A. Goldberg, Wayne R. McKinney, 2013 .

Lithographic characterization of low-order aberrations in a 0.3-NA EUV microfield exposure tool

Kenneth A. Goldberg, Patrick Naulleau, Kim Dean, 2006, SPIE Advanced Lithography.

Detectability and printability of EUVL mask blank defects for the 32-nm HP node

Kenneth A. Goldberg, Wonil Cho, Chan-Uk Jeon, 2007, SPIE Photomask Technology.

Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic

Kenneth A. Goldberg, Kevin Bradley, Farhad Salmassi, 2004, SPIE Advanced Lithography.

Examination of phase retrieval algorithms for patterned EUV mask metrology

Kenneth A. Goldberg, Patrick P. Naulleau, Antoine Wojdyla, 2015, SPIE Photomask Technology.

New ways of looking at masks with the SHARP EUV microscope

Kenneth A. Goldberg, Markus P. Benk, David G. Johnson, 2015, Advanced Lithography.

Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach

Kenneth A. Goldberg, Iacopo Mochi, Thomas V. Pistor, 2015 .

Image-based pupil plane characterization via principal component analysis for EUVL tools

Kenneth A. Goldberg, Bruce W. Smith, Antoine Wojdyla, 2016, SPIE Advanced Lithography.

Pupil shaping and coherence control in an EUV mask-imaging microscope

Kenneth A. Goldberg, Patrick P. Naulleau, Iacopo Mochi, 2013, Photomask Technology.

EUV photolithography mask inspection using Fourier ptychography

Kenneth A. Goldberg, Patrick P. Naulleau, Antoine Wojdyla, 2018, Commercial + Scientific Sensing and Imaging.

Honing the accuracy of extreme-ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic

Kenneth A. Goldberg, Patrick P. Naulleau, Henry N. Chapman, 2002, SPIE Advanced Lithography.

Lithographic evaluation of the EUV engineering test stand

Pei-yang Yan, Donald W. Sweeney, Kenneth A. Goldberg, 2002, SPIE Advanced Lithography.

Critical challenges for EUV resist materials

Kenneth A. Goldberg, Patrick P. Naulleau, Christopher N. Anderson, 2011, Advanced Lithography.

Aberration estimation using EUV mask roughness

Kenneth A. Goldberg, Laura Waller, Patrick P. Naulleau, 2015, Advanced Lithography.

Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging

Kenneth A. Goldberg, Obert Wood, Antoine Wojdyla, 2015, Other Conferences.

Investigation of the current resolution limits of advanced EUVresists

Kenneth A. Goldberg, Adam R. Pawloski, Paul Denham, 2005 .

Advanced 0.3-NA EUV lithography capabilities at the ALS

Kenneth A. Goldberg, Patrick Naulleau, Paul Denham, 2005 .

EUV focus sensor design optimization

Kenneth A. Goldberg, J. A. Liddle, M. E. Teyssier, 2005 .

Printing-based performance analysis of the engineering test stand set-2 optic using a synchrotron exposure station with variable sigma

Kenneth A. Goldberg, Sherry L. Baker, Patrick P. Naulleau, 2003 .

Characterization of the accuracy of EUV phase-shifting point diffraction interferometry

Kenneth A. Goldberg, Patrick P. Naulleau, Jeffrey Bokor, 1998, Advanced Lithography.

EUV interferometry of a four-mirror ring-field EUV optical system

Kenneth A. Goldberg, Patrick P. Naulleau, Erik H. Anderson, 2000, Advanced Lithography.

Advances in full field microscopy with table-top soft x-ray lasers

Kenneth A. Goldberg, Yong Wang, Erik H. Anderson, 2009, Optical Engineering + Applications.

Advanced X-ray Optics Metrology for Nanofocusing and Coherence Preservation - eScholarship

Kenneth A. Goldberg, 2008 .

At-wavelength characterization of DUV-radiation-induced damage in fused silica

Kenneth A. Goldberg, Patrick P. Naulleau, Jeffrey Bokor, 2000, Advanced Lithography.

EUV scattering and flare of 10X projection cameras

Kenneth A. Goldberg, Sherry L. Baker, Patrick P. Naulleau, 1999, Advanced Lithography.

At-wavelength testing of optics for EUV

Kenneth A. Goldberg, Jeffrey Bokor, David T. Attwood, 1995, Advanced Lithography.

Image-based pupil plane characterization via a space-domain basis

Kenneth A. Goldberg, Bruce W. Smith, Obert Wood, 2017 .

Aerial imaging study of the mask-induced line-width roughness of EUV lithography masks

Kenneth A. Goldberg, Patrick P. Naulleau, Antoine Wojdyla, 2016, SPIE Advanced Lithography.

Comparison of fast 3D simulation and actinic inspection for EUV masks with buried defects

Kenneth A. Goldberg, Iacopo Mochi, Andrew R. Neureuther, 2009, Advanced Lithography.

EUV Optical Testing

Kenneth A. Goldberg, 2008 .

EUV actinic brightfield mask microscopy for predicting printed defect images

Kenneth A. Goldberg, Obert Wood, Antoine Wojdyla, 2015, SPIE Photomask Technology.

EUV pattern defect detection sensitivity based on aerial image linewidth measurements

Kenneth A. Goldberg, Sungmin Huh, Patrick P. Naulleau, 2009 .

DFX via the Internet

Kenneth A. Goldberg, Rick Wagner, Giuseppe Castanotto, 1995, Optics East.

Methodology for optimal in situ alignment and setting of bendable optics for nearly diffraction-limited focusing of soft x-rays

Gregory Y. Morrison, Valeriy V. Yashchuk, Kenneth A. Goldberg, 2013 .

Performance of actinic EUVL mask imaging using a zoneplate microscope

Kenneth A. Goldberg, Farhad Salmassi, Eric M. Gullikson, 2007, SPIE Photomask Technology.

EUV microexposures at the ALS using the 0.3-NA MET projection optics

Kenneth A. Goldberg, Patrick Naulleau, Brian Hoef, 2005, SPIE Advanced Lithography.

Binary Amplitude Reflection Gratings for X-ray Shearing and Hartmann Wavefront Sensors

Kenneth A. Goldberg, Antoine Wojdyla, Diane Bryant, 2021, Sensors.

22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool

Kenneth A. Goldberg, Warren Montgomery, Patrick P. Naulleau, 2009 .

Preparations for extreme ultraviolet interferometry of the 0.3 numerical aperture Micro Exposure Tool optic

Kenneth A. Goldberg, Patrick P. Naulleau, Eric M. Gullikson, 2003 .

Actinic characterization of extreme ultraviolet bump-type phase defects

Kenneth A. Goldberg, Iacopo Mochi, 2011 .

Actinic Inspection of EUV Programmed Multilayer Defects and Cross-Comparison Measurements

Kenneth A. Goldberg, Tsuneo Terasawa, Patrick A. Kearney, 2006 .

X ray Wavefront Hartmann Sensor

Kenneth A. Goldberg, Xavier Levecq, Guillaume Dovillaire, 2004 .

Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source

Kenneth A. Goldberg, Patrick P. Naulleau, Erik H. Anderson, 2005 .

Extreme ultraviolet interferometric measurements of diffraction-limited optics

Kenneth A. Goldberg, Patrick P. Naulleau, Jeffrey Bokor, 1999 .

Photon flux requirements for extreme ultraviolet reticle imaging in the 22- and 16-nm nodes

Daniel Wintz, Kenneth A. Goldberg, Sungmin Huh, 2010 .

Interferometric at-wavelength flare characterization of extreme ultraviolet optical systems

Kenneth A. Goldberg, Patrick P. Naulleau, Eric M. Gullikson, 1999 .

Effects of radiation-induced carbon contamination on the performance of an EUV lithographic optic

Kenneth A. Goldberg, Anton Barty, A. Barty, 2003, SPIE Advanced Lithography.

Native blank defect analysis for the study of printability

Kenneth A. Goldberg, Sungmin Huh, Iacopo Mochi, 2010 .

At-wavelength alignment and testing of the 0.3 NA MET optic

Kenneth A. Goldberg, Patrick P. Naulleau, Erik H. Anderson, 2004 .

Metrology for the Advancement of X-ray Optics at the ALS

Valeriy V. Yashchuk, Kenneth A. Goldberg, Howard A. Padmore, 2013 .

Actinic imaging and evaluation of phase structures on EUV lithography masks

Kenneth A. Goldberg, Sungmin Huh, Iacopo Mochi, 2010 .

The EUV phase-shifting point diffraction interferometer

Kenneth A. Goldberg, Patrick P. Naulleau, Jeffrey Bokor, 2001 .

Creating an EUV mask microscope for lithography generations reaching 8 NM

Kenneth A. Goldberg, Carl W. Cork, Patrick P. Naulleau, 2012 .

Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2010 .

Point Diffraction Interferometry at EUV Wavelengths

Kenneth A. Goldberg, Jeffrey Bokor, David T. Attwood, 1994 .

Interferometry using undulator sources (invited, abstract)

Kenneth A. Goldberg, Jeffrey Bokor, Edita Tejnil, 1996 .

At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic

Kenneth A. Goldberg, Patrick P. Naulleau, Eric M. Gullikson, 2001 .

Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

Kenneth A. Goldberg, Regina Soufli, Patrick P. Naulleau, 2002 .

Testing extreme ultraviolet optical systems at-wavelength with sub-angstrom accuracy

Kenneth A. Goldberg, K. Goldberg, 1999 .

Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool

Kenneth A. Goldberg, Patrick P. Naulleau, Christopher N. Anderson, 2007 .

The SEMATECH Berkeley MET : extending EUV learning to 16-nm half pitch

Kenneth A. Goldberg, Patrick P. Naulleau, Christopher N. Anderson, 2011 .

Actinic EUV mask inspection beyond 0.25 NA

Kenneth A. Goldberg, Sungmin Huh, Patrick P. Naulleau, 2008 .

In situ fine tuning of bendable soft x-ray mirrors using a lateral shearing interferometer

Gregory Y. Morrison, Valeriy V. Yashchuk, Kenneth A. Goldberg, 2013 .

Comparison of fast three-dimensional simulation and actinic inspection for extreme ultraviolet masks with buried defects and absorber features

Kenneth A. Goldberg, Iacopo Mochi, Andrew R. Neureuther, 2009 .

First lithographic results from the extreme ultraviolet Engineering Test Stand

Richard H. Stulen, Donald W. Sweeney, Kenneth A. Goldberg, 2001 .

Effect of carbon contamination on the printing performance of extreme ultraviolet masks

Kenneth A. Goldberg, Sungmin Huh, Patrick P. Naulleau, 2010 .

High-accuracy interferometry of extreme ultraviolet lithographic optical systems

Kenneth A. Goldberg, Patrick P. Naulleau, Jeffrey Bokor, 1998 .

Actinic extreme ultraviolet mask inspection beyond 0.25numericalaperture

Kenneth A. Goldberg, Sungmin Huh, Patrick P. Naulleau, 2008 .

A Synchrotron‐Based Fourier‐Synthesis Custom‐Coherence Illuminator

Kenneth A. Goldberg, Patrick P. Naulleau, Paul Denham, 2004 .

Direct index of refraction measurement at extreme ultraviolet wavelength region with a novel interferometer

Kenneth A. Goldberg, Patrick P. Naulleau, Eric M. Gullikson, 2001 .

Advanced X-ray Optics Metrology for Nanofocusing and Coherence Preservation

Kenneth A. Goldberg, K. Goldberg, 2007 .

Phase-Shifting Point Diffraction Interferometry for at-wavelength Testing of Lithographic Optics

Kenneth A. Goldberg, Jeffrey Bokor, David T. Attwood, 1996 .

Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images

Kenneth A. Goldberg, Bruce W. Smith, Vicky Philipsen, 2014 .

Testing extreme ultraviolet optics with visible-light and extreme ultraviolet interferometry

Kenneth A. Goldberg, Anton Barty, Patrick P. Naulleau, 2002 .

Extreme ultraviolet alignment and testing of a four-mirror ring field extreme ultraviolet optical system

Kenneth A. Goldberg, Patrick P. Naulleau, Erik H. Anderson, 2000 .

A 3-D Numerical Study of Pinhole Diffraction to Predict the Accuracy of EUV Point Diffraction Interferometry

Kenneth A. Goldberg, Jeffrey Bokor, E. Tejnil, 1995 .

At‐Wavelength Interferometry of High‐NA Diffraction‐Limited EUV Optics

Kenneth A. Goldberg, Patrick P. Naulleau, Erik H. Anderson, 2003 .

Surface slope metrology and interferometric wave front measurements on deformable soft x-ray mirrors performed in the laboratory and in-situ at-wavelength.

Valeriy V. Yashchuk, Kenneth A. Goldberg, Wayne R. McKinney, 2010 .

At-wavelength interferometry for extreme ultraviolet lithography

Kenneth A. Goldberg, Jeffrey Bokor, Sang Hun Lee, 1997 .

Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2015 .

Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions

Kenneth A. Goldberg, Patrick P. Naulleau, Eric M. Gullikson, 1999 .

Progress towards λ/20 extreme ultraviolet interferometry

Kenneth A. Goldberg, Jeffrey Bokor, David T. Attwood, 1995 .

Lithographic characterization of the printability of programmed extreme ultraviolet substrate defects

Kenneth A. Goldberg, Sherry L. Baker, Patrick P. Naulleau, 2003 .

Off-axis Aberration Estimation in an EUV Microscope Using Natural Speckle

Kenneth A. Goldberg, Laura Waller, Jonathan Dong, 2016 .

Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool

Kenneth A. Goldberg, Warren Montgomery, Patrick P. Naulleau, 2008 .

Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical system

Kenneth A. Goldberg, Patrick P. Naulleau, Jeffrey Bokor, 2000 .

Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic

Kenneth A. Goldberg, Patrick P. Naulleau, Farhad Salmassi, 2004 .

Extreme ultraviolet interferometry

Kenneth A. Goldberg, K. Goldberg, 1997 .

Multiplexed high resolution soft x-ray RIXS

Kenneth A. Goldberg, Markus P. Benk, Christopher N. Anderson, 2016 .

Surface Slope Metrology on Deformable Soft X-ray Mirrors

Valeriy V. Yashchuk, Kenneth A. Goldberg, Wayne R. McKinney, 2010 .

Enabling EUV Ressist Research at the 1 and Smaller Regime

Kenneth A. Goldberg, Patrick P. Naulleau, Mark Neisser, 2015 .