Paul Zimmerman

TorsionNet: A Reinforcement Learning Approach to Sequential Conformer Search pdf

Ambuj Tewari, Joshua Kammeraad, Ziping Xu, 2020, NeurIPS.

Novel high-index resists for 193-nm immersion lithography and beyond

Will Conley, Lan Chen, Alvina M. Williams, 2007, SPIE Advanced Lithography.

Amplification of the index of refraction of aqueous immersion fluids by ionic surfactants

Bruce W. Smith, Will Conley, Nicholas J. Turro, 2005, SPIE Advanced Lithography.

Reliable Transition State Searches Integrated with the Growing String Method.

Paul Zimmerman, P. Zimmerman, 2013, Journal of chemical theory and computation.

High-RI resist polymers for 193 nm immersion lithography

Will Conley, Andrew K. Whittaker, Idriss Blakey, 2005, SPIE Advanced Lithography.

157-nm pellicles for photolithography: mechanistic investigation of the deep-UV photolysis of fluorocarbons

Roger H. French, Robert Clayton Wheland, M. F. Lemon, 2004, SPIE Advanced Lithography.