J. Domaschke

Productivity improvement for dry etch equipment through the application of simulation

H. Jetter, S. Pampel, J. Domaschke, 2000, Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130).

Implementation of modeling and simulation in semiconductor wafer fabrication with time constraints between wet etch and furnace operations

J. Domaschke, W. Scholl, 2000 .

Implementation of modeling and simulation in semiconductor wafer fabrication with time constraints between wet etch and furnace operations

J. Domaschke, W. Scholl, J. Domaschke, 1999, 1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314).