Misao Sekimoto

Printability of organic defects on an x-ray mask

Ikuo Okada, Tadahito Matsuda, Takashi Ohkubo, 1994, Photomask and Next Generation Lithography Mask Technology.

Repairing Ta absorber x-ray masks with gas-assisted focused-ion-beam etching

Ikuo Okada, Tadahito Matsuda, Yasunao Saitoh, 1997, Photomask and Next Generation Lithography Mask Technology.

Cleaning process for x-ray masks

Ikuo Okada, Tadahito Matsuda, Takashi Ohkubo, 1996, Photomask and Next Generation Lithography Mask Technology.

Approach to fabricating defect-free x-ray masks

Ikuo Okada, Tadahito Matsuda, Takashi Ohkubo, 1995, Advanced Lithography.

Repairing x-ray masks with Ta absorbers using focused ion beams

Ikuo Okada, Tadahito Matsuda, Takashi Ohkubo, 1995, Photomask and Next Generation Lithography Mask Technology.

Roentgenstrahlenlithographie-mask and process for its manufacture

Toshiro Ono, Akira Ozawa, Hideo Yoshihara, 1983 .

Enhanced defect inspection method for x-ray masks

Ikuo Okada, Tadahito Matsuda, Yasunao Saitoh, 1996, Advanced Lithography.

Defect‐free x‐ray masks for 0.2‐μm large‐scale integrated circuits

Ikuo Okada, Tadahito Matsuda, Takashi Ohkubo, 1996 .

Silicon Nitride Single-Layer X-Ray Mask

Hideo Yoshihara, Takashi Ohkubo, Misao Sekimoto, 1981 .