Jochen Bender

First measurement data obtained on the new Vistec LMS IPRO4

Frank Laske, Artur Boesser, Michael Heiden, 2007, European Mask and Lithography Conference.

Registration metrology on double patterning reticles

Frank Laske, Oliver Ache, Karl-Heinrich Schmidt, 2009, European Mask and Lithography Conference.

Actual measurement data obtained on new 65nm generation mask metrology tool set

Gerd Scheuring, Frank Hillmann, Klaus-Dieter Roth, 2005, Other Conferences.