Hiroyoshi Fukuro

Development of full-fill bottom antireflective coatings for dual-damascene process

James E. Lamb, Satoshi Takei, Xie Shao, 2001, SPIE Advanced Lithography.

High-etch-rate type 248-nm bottom antireflective coatings

Tomoyuki Enomoto, Ken-Ichi Mizusawa, Shinya Arase, 2001, SPIE Advanced Lithography.