Tatsuya Nagatomo

Contact mask LER impact on lithographic performance

Masaru Higuchi, Mitsuharu Yamana, Tatsuya Nagatomo, 2010, Photomask Japan.

Comparison of lithographic performance between MoSi binary mask and MoSi attenuated PSM

Vicky Philipsen, Matthew Lamantia, Mitsuharu Yamana, 2009, Photomask Japan.

Effects of mask pattern transmission on ArF lithographic performance in contact hole patterning

Yosuke Kojima, Mitsuharu Yamana, Kazuaki Matsui, 2021 .

Study of high-transmission PSM for lithographic performance and defect control

Yosuke Kojima, Mitsuharu Yamana, Kazuaki Matsui, 2021, Photomask Japan.