Kevin Lucas

发表

Rigorous assessment of patterning solution of metal layer in 7 nm technology node

Thomas Schmoeller, Weimin Gao, Ivan Ciofi, 2016 .

Rigorous vectorial modeling for polarized illumination and projection pupil in OPC

James P. Shiely, Kevin Lucas, Qiaolin Zhang, 2008, Photomask Japan.

Investigation of EUV tapeout flow issues, requirements, and options for volume manufacturing

Insung Kim, Kevin Lucas, Munhoe Do, 2011, Advanced Lithography.

100-nm generation contact patterning by low temperature 193-nm resist reflow process

Frieda Van Roey, Kevin Lucas, Veerle Van Driessche, 2002, SPIE Advanced Lithography.

New methodologies for lower-K1 EUV OPC and RET optimization

Guangming Xiao, Kevin Lucas, Kevin Hooker, 2017, Advanced Lithography.

Implications of triple patterning for 14nm node design and patterning

Bei Yu, David Z. Pan, Kevin Lucas, 2012, Advanced Lithography.

Operación matemática con switches y presentados en leds

Kevin Lucas, Carlos Valdivieso, 2012 .

A discussion of the regression of physical parameters for photolithographic process models

Lawrence S. Melvin, Kevin Lucas, 2007, SPIE Advanced Lithography.

Strategies of optical proximity correction dedicated to chromeless phase lithography for 65 and 45 nm node

Will Conley, Kevin Lucas, Bryan S. Kasprowicz, 2004, SPIE Advanced Lithography.

ILT optimization of EUV masks for sub-7nm lithography

Guangming Xiao, Kevin Lucas, Kevin Hooker, 2017, European Mask and Lithography Conference.

Double patterning addressing imaging challenges for near- and sub-k1=0.25 node layouts

Kevin Lucas, Sung-Ho Lee, Sooryong Lee, 2009, Photomask Japan.

Patterning control budgets for the 32-nm generation incorporating lithography, design, and RET variations

Kevin Lucas, Chris Cork, Brian Ward, 2007, SPIE Advanced Lithography.

Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination

Will Conley, John S. Petersen, David J. Gerold, 2002, SPIE Advanced Lithography.

A high-performance triple patterning layout decomposer with balanced density

David Z. Pan, Bei Yu, Yen-Hung Lin, 2013, 2013 IEEE/ACM International Conference on Computer-Aided Design (ICCAD).

Interactions of double patterning technology with wafer processing, OPC and design flows

Vincent Wiaux, Staf Verhaegen, Kevin Lucas, 2008, SPIE Advanced Lithography.

32nm design rule and process exploration flow

Kevin Lucas, Ji Li, Yunqiang Zhang, 2008, Photomask Technology.

Requirements and results of a full-field EUV OPC flow

Kevin Lucas, Brian Ward, Stephen Jang, 2009, Advanced Lithography.

Double-patterning interactions with wafer processing, optical proximity correction, and physical design flows

Vincent Wiaux, Staf Verhaegen, Kevin Lucas, 2009 .

ArF solutions for low-k1 back-end imaging

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

Simulation study of CD variation caused by field edge effects and out-of-band radiation in EUVL

Ardavan Niroomand, Gian F. Lorusso, Weimin Gao, 2013, Photomask Technology.

Analysis of OPC optical model accuracy with detailed scanner information

Kevin Lucas, Jacek K. Tyminski, Hua Song, 2008, SPIE Advanced Lithography.

Correction of long-range effects applied to the 65-nm node

Jean-Damien Chapon, Jerome Belledent, Stanislas Baron, 2005, Photomask Japan.

Patterning process exploration of metal 1 layer in 7nm node with 3D patterning flow simulations

Thomas Schmoeller, Weimin Gao, Ivan Ciofi, 2015, Advanced Lithography.

Sensitivity of a variable threshold model toward process and modeling parameters

Kevin Lucas, Jérôme Belledent, Christophe Couderc, 2006, SPIE Photomask Technology.

Layout decomposition of self-aligned double patterning for 2D random logic patterning

David Z. Pan, Yongchan Ban, Kevin Lucas, 2011, Advanced Lithography.

Line-edge roughness reduction and CD slimming using hardback processing

Frieda Van Roey, Jonathan L. Cobb, Monique Ercken, 2003, SPIE Advanced Lithography.

EUV modeling accuracy and integration requirements for the 16nm node

Eric Hendrickx, Gian F. Lorusso, Kevin Lucas, 2010, Advanced Lithography.

Double-patterning-friendly OPC

Kevin Lucas, Chris Cork, Xiaohai Li, 2009, Advanced Lithography.

Suppressing ringing effects from very strong off-axis illumination with novel OPC approaches for low k1 lithography

Amyn Poonawala, Kevin Lucas, Chris Cork, 2010, Advanced Lithography.

Experimental validation of stochastic modeling for negative-tone develop EUV resists

Geert Vandenberghe, Danilo De Simone, Eric Hendrickx, 2015, Advanced Lithography.

Improved testpatterns and coverage for complex SrAF to optimize 5nm and below OPC and mask patterning

Kevin Lucas, Yu Chen, Ahmed Omran, 2017, Photomask Technology.

Process, design and optical proximity correction requirements for the 65nm device generation

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

3D NTD resist deformation compact model for OPC and ILT applications

Kevin Lucas, Hua Song, Rich Wu, 2018, Photomask Technology.

Critical failure ORC: Improving model accuracy through enhanced model generation

Jerome Belledent, Stanislas Baron, Kevin Lucas, 2006 .

Avoiding wafer-print artifacts in spacer is dielectric (SID) patterning

Peter De Bisschop, Kevin Lucas, Gerard Luk-Pat, 2013, Advanced Lithography.

Design compliance for spacer is dielectric (SID) patterning

Li Lin, Peter De Bisschop, Kevin Lucas, 2012, Advanced Lithography.

The impact of scanner model vectorization on optical proximity correction

Tomoyuki Matsuyama, Kevin Lucas, Qiaolin Zhang, 2007, Photomask Japan.

Decomposition difficulty analysis for double patterning and the impact on photomask manufacturability

Yasutaka Morikawa, Naoya Hayashi, Yuichi Inazuki, 2008, SPIE Advanced Lithography.

High-transmission mask technology for 45nm node imaging

Will Conley, Jonathan Cobb, Chris Progler, 2006, SPIE Advanced Lithography.

Line end shortening in CPL mask technology

Will Conley, Robert John Socha, Chris Progler, 2005 .

Computational lithography work flows and design rule exploration automation

Kevin Lucas, Satyendra Sethi, Duck-Hyung Hur, 2012, Advanced Lithography.

Modeling scanner signatures in the context of OPC

Kevin Lucas, Qiaolin Zhang, Jacek K. Tyminski, 2007, SPIE Photomask Technology.

Immersion lithography robustness for the C065 node

Will Conley, Jean-Damien Chapon, Jerome Belledent, 2006, SPIE Advanced Lithography.

Printability verification for double-patterning technology

Vincent Wiaux, Mireille Maenhoudt, Staf Verhaegen, 2008, Photomask Technology.

Checking design conformance and optimizing manufacturability using automated double patterning decomposition

Vincent Wiaux, Mireille Maenhoudt, Staf Verhaegen, 2008, SPIE Advanced Lithography.

Study of CD variation caused by the black border effect and out-of-band radiation in extreme ultraviolet lithography

Gian Francesco Lorusso, Ardavan Niroomand, Weimin Gao, 2014 .

Optimization of RET flow using test layout

Kevin Lucas, Yunqiang Zhang, Satyendra Sethi, 2008, Lithography Asia.

Building block style recipes for productivity improvement in OPC, RET and ILT flows

Kevin Lucas, Xiaohui Chen, Tom Cecil, 2016, SPIE Advanced Lithography.

Hybrid resist model to enhance continuous process window model for OPC

Kevin Lucas, Qiaolin Zhang, 2008, Photomask Japan.

Mask compensation for process flare in 193nm very low k1 lithography

Donggyu Yim, Sung-Woo Lee, Kevin Lucas, 2013, Advanced Lithography.

Process window and integration results for full-chip model-based assist-feature placement at the 32 nm node and below

Ji Li, Amyn Poonawala, Kevin Lucas, 2010, Advanced Lithography.

Modeling of focus blur in the context of optical proximity correction

James P. Shiely, Kevin Lucas, Hua Song, 2008, SPIE Advanced Lithography.

Efficient post-OPC lithography hotspot detection using a novel OPC correction and verification flow

Kevin Lucas, Qiaolin Zhang, Paul VanAdrichem, 2007, Photomask Japan.

Investigation of machine learning for dual OPC and assist feature printing optimization

Kevin Lucas, Kevin Hooker, Marco Guajardo, 2019, Advanced Lithography.

High transmission mask technology for 45nm node imaging

Will Conley, Jonathan L. Cobb, Chris Progler, 2006, SPIE Advanced Lithography.

Process window OPC verification: dry versus immersion lithography for the 65nm node

Jerome Belledent, Kevin Lucas, Christophe Couderc, 2006, SPIE Advanced Lithography.

Experimental validation of rigorous, 3D profile models for negative-tone develop resists

Peter De Bisschop, Thomas Schmoeller, Kevin Lucas, 2014, Advanced Lithography.

Double patterning interactions with wafer processing, OPC and physical design flows

Kevin Lucas, 2009, 2009 International Symposium on VLSI Technology, Systems, and Applications.

Binary modeling method to check the sub-resolution assist features (SRAFs) printability

Qiliang Yan, Peter De Bisschop, Lawrence S. Melvin, 2012, Advanced Lithography.

Investigation of model-based physical design restrictions (Invited Paper)

Jerome Belledent, Stanislas Baron, Kevin Lucas, 2005, SPIE Advanced Lithography.

Resist development modeling for OPC accuracy improvement

Lawrence S. Melvin, Kevin Lucas, Brian Ward, 2009, Advanced Lithography.

Cost effective solution using inverse lithography OPC for DRAM random contact layer

Guangming Xiao, Kevin Lucas, Munhoe Do, 2017, Advanced Lithography.

Energy expenditure, and comfort in a modified wheelchair for people with hemiplegia: A controlled trial

Kevin Lucas, Anne Mandy, Samuel Lesley, 2007, Disability and rehabilitation. Assistive technology.

Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32 nm

Kevin Lucas, Jacek K. Tyminski, Joseph S. Gordon, 2007 .

Through-process window resist modelling strategies for the 65 nm node

Jerome Belledent, Stanislas Baron, Kevin Lucas, 2005, SPIE Photomask Technology.

Comparing traditional OPC to field-based OPC for 45-nm node production

Kevin Lucas, Robert Lugg, Josh Tuttle, 2007, SPIE Advanced Lithography.

The impact of illumination on feature fidelity for CPL mask technology

Will Conley, Chris Progler, Stephen Hsu, 2004, SPIE Advanced Lithography.

El ahorcado y pwm

Kevin Lucas, Carlos Valdivieso, 2012 .

Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison

Vincent Wiaux, Lawrence S. Melvin, Vicky Philipsen, 2018, Advanced Lithography.

Continuous process window modeling for process variation aware OPC and lithography verification

Qiliang Yan, Kevin Lucas, Yunqiang Zhang, 2008, SPIE Advanced Lithography.

Improving model-based OPC performance for the 65-nm node through calibration set optimization

Jerome Belledent, Stanislas Baron, Kevin Lucas, 2005, SPIE Advanced Lithography.

65nm OPC and design optimization by using simple electrical transistor simulation

Jean-Damien Chapon, Jerome Belledent, Franck Arnaud, 2005, SPIE Advanced Lithography.

Scanner-characteristics-aware OPC modeling and correction

Laurent Depre, Kevin Lucas, Jacek K. Tyminski, 2007, SPIE Advanced Lithography.

Polarization aberration modeling via Jones matrix in the context of OPC

Kevin Lucas, Qiaolin Zhang, Hua Song, 2007, SPIE Photomask Technology.

Comprar Using Process Simulators in Chemical Engineering: A Multimedia Guide for the Core Curriculum, (Version 2.3) | Anne Mandy | 9780470533390 | Wiley

Kevin Lucas, Daniel R. Lewin, Anne Mandy, 2009 .

Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination

Will Conley, John S. Petersen, David J. Gerold, 2002, SPIE Advanced Lithography.

Application of layout DOE in RET flow

Ji Li, Kevin Lucas, Paul van Adrichem, 2008, SPIE Advanced Lithography.

Large-scale double-patterning compliant layouts for DP engine and design rule development

Christopher Cork, Kevin Lucas, Levi D. Barnes, 2009, Advanced Lithography.

Point-source approach of source-mask optimization

Vitaliy Domnenko, Kevin Lucas, Wolfgang Demmerle, 2010, Photomask Japan.

Functionality and performance improvements with field-based OPC

Kevin Lucas, Robert Lugg, Ben Painter, 2007, Photomask Japan.

Model-driven target optimization to resolve design hotspots through image quality enhancement

Guangming Xiao, Tom Cecil, Kevin Lucas, 2013, Photomask Technology.

Hybrid inverse lithography techniques for advanced hierarchical memories

Guangming Xiao, Kevin Lucas, Kevin Hooker, 2014, Advanced Lithography.

Modeling mask pellicle effects for OPC/RET

James P. Shiely, Kevin Lucas, Qiaolin Zhang, 2008, Photomask Japan.

Filtered Gating Systems: Check the Charts, But Watch the Flow

Kevin Lucas, 2015 .

Focus blur model to enhance lithography model for optical proximity correction

Kevin Lucas, Qiaolin Zhang, Hua Song, 2008, Photomask Technology.

High transmission mask technology for 45nm node imaging

Will Conley, Jonathan Cobb, Chris Progler, 2004, SPIE Advanced Lithography.

Optical issues of thin organic pellicles in 45-nm and 32-nm immersion lithography

Will Conley, Kevin Lucas, Mazen Saied, 2006, SPIE Photomask Technology.

Process variation aware OPC modeling for leading edge technology nodes

Kevin Lucas, Ebo Croffie, Yongfa Fan, 2009, Advanced Lithography.

Implementing and validating double patterning in 22-nm to 16-nm product design and patterning flows

Christopher Cork, Kevin Lucas, Beom-Seok Seo, 2010, Advanced Lithography.

Low-temperature 193-nm resist reflow process for 100-nm generation contact patterning

Frieda Van Roey, Kevin Lucas, Veerle Van Driessche, 2001, Microelectronic and MEMS Technologies.

Reticle enhancement verification for the 65nm and 45nm nodes

Robert Boone, Jerome Belledent, Kevin Lucas, 2006, SPIE Advanced Lithography.

High accuracy 65nm OPC verification: full process window model vs. critical failure ORC

Jerome Belledent, Stanislas Baron, Kevin Lucas, 2004, SPIE Advanced Lithography.

Dual layer patterning failures in complex RET processes using ORC tools and pre- or post-optical proximity correction strategy

Jerome Belledent, Stanislas Baron, Kevin Lucas, 2005, Photomask Japan.

A fast triple patterning solution with fix guidance

Peter De Bisschop, Kevin Lucas, Julien Mailfert, 2014, Advanced Lithography.

Advanced 193 tri-tone EAPSM (9%-18%) for 65 nm node

Will Conley, Greg P. Hughes, Laurent Dieu, 2002, Photomask Technology.

Validation of machine learning OPC compact models for advanced manufacturing

Kevin Lucas, Marco Guajardo, Cheng-En Wu, 2021 .

Predicting very rare stochastic defects in EUVL processes for full-chip correction and verification

Kevin Lucas, Yudhishthir Kandel, Makoto Miyagi, 2021 .

Exploration of etch step interactions in the dual patterning process for process modeling

Vincent Wiaux, Lawrence S. Melvin, Mireille Maenhoudt, 2008 .

Triple patterning in 10nm node metal lithography

David Z. Pan, Kevin Lucas, Chris Cork, 2012 .