Thomas W. Forstner

Optimization of an integrated and automated macro inspection system for the utilization of wafer color variation detection in a photolithography cluster

David S. Dixon, Robert L. Isaacson, Vinayan C. Menon, 2006, SPIE Advanced Lithography.

Product and tool control using integrated auto-macro defect inspection in the photolithography cluster

Robert L. Isaacson, Vinayan C. Menon, Stephen J. Lickteig, 2006, SPIE Advanced Lithography.