Benny Gosali

Improving focus performance at litho using diffraction-based focus metrology, novel calibration methods, interface, and control loop

Frank Staals, Jiarui Hu, Kaustuve Bhattacharyya, 2016, SPIE Advanced Lithography.

Color mixing in overlay metrology for greater accuracy and robustness

Arie den Boef, Kaustuve Bhattacharyya, John Lin, 2019, Advanced Lithography.

Multi-wavelength approach towards on-product overlay accuracy and robustness

Arie den Boef, Kaustuve Bhattacharyya, John Lin, 2018, Advanced Lithography.

Characterization of metrology to device overlay offset and novel methods to minimize it

Jeff Lin, Kaustuve Bhattacharyya, Marc Noot, 2021, Advanced Lithography.