Chandreswar Mahata

Effects of constant voltage stressing on HfTaOx/SiGe gate stack

S. Mallik, Chandreswar Mahata, M. K. Hota, 2012, Other Conferences.

Zinc Tin Oxide Synaptic Device for Neuromorphic Engineering

Byung-Do Yang, Seongjae Cho, Yoon Kim, 2020, IEEE Access.

Noise characterization of ALD HfO2 MOS capacitors with different metal (Au, Pd and Pt) gates

Goutam Kumar Dalapati, S. Mallik, Chandreswar Mahata, 2012, Other Conferences.

TiO2/GeOxNy stacked gate dielectrics for Ge-MOSFETs

Chandreswar Mahata, C. K. Maiti, Milan Bera, 2007 .

Effects of Ti incorporation on the interface properties and band alignment of HfTaOx thin films on sulfur passivated GaAs

Chandreswar Mahata, C. K. Maiti, Enrique Miranda, 2011 .

Synaptic Characteristics of Amorphous Boron Nitride-based Memristors on a Highly Doped Silicon Substrate for Neuromorphic Engineering.

Byung-Gook Park, Chandreswar Mahata, Sungjun Kim, 2020, ACS applied materials & interfaces.

Graphene as an atomically thin barrier to Cu diffusion into Si.

Chandreswar Mahata, Juree Hong, Sanggeun Lee, 2014, Nanoscale.

Switchable Water‐Adhesive, Superhydrophobic Palladium‐Layered Silicon Nanowires Potentiate the Angiogenic Efficacy of Human Stem Cell Spheroids

Chandreswar Mahata, Kihong Lee, Wooyoung Lee, 2014, Advanced materials.