Aviram Tam

CD-SEM application for generic analysis of two-dimensional features on wafers and reticles

Ofer Adan, Ovadya Menadeva, Ram Peltinov, 2004, SPIE Advanced Lithography.

Physical matching versus CD matching for CD SEM

Roman Kris, Zion Hadad, Galit Zuckerman, 2007, SPIE Advanced Lithography.

Aerial image based die-to-model inspections of advanced technology masks

Shmoolik Mangan, Jun Kim, Vivek Balasubramanian, 2009, Photomask Technology.

Small feature accuracy challenge for CD-SEM metrology physical model solution

Ofer Adan, Sergey Latinski, Benjamin Bunday, 2006, SPIE Advanced Lithography.

Computational inspection applied to a mask inspection system with advanced aerial imaging capability

Vikram Tolani, Linyong Pang, Thuc Dam, 2010, Photomask Japan.

Deployment of OASIS.MASK (P44) as direct input for mask inspection of advanced photomasks

Emile Sahouria, Pradiptya Ghosh, Yan Liu, 2009, Photomask Technology.

Mask degradation monitoring with aerial mask inspector

Wen-Jui Tseng, Aviram Tam, Shih-Ping Lu, 2013, Photomask and Next Generation Lithography Mask Technology.