Liraz Segal

CD-SEM application for generic analysis of two-dimensional features on wafers and reticles

Ofer Adan, Ovadya Menadeva, Ram Peltinov, 2004, SPIE Advanced Lithography.

Mask metrology 2D application for measurement of OPC features and corner roundness

Ovadya Menadeva, Ram Peltinov, Roman Kris, 2004, Photomask Japan.