Naftali Shcolnik

CD-SEM application for generic analysis of two-dimensional features on wafers and reticles

Ofer Adan, Ovadya Menadeva, Ram Peltinov, 2004, SPIE Advanced Lithography.

Physical matching versus CD matching for CD SEM

Roman Kris, Zion Hadad, Galit Zuckerman, 2007, SPIE Advanced Lithography.

Mask metrology 2D application for measurement of OPC features and corner roundness

Ovadya Menadeva, Ram Peltinov, Roman Kris, 2004, Photomask Japan.

Corner roundness and contact area algorithms for reticle metrology through the use of region connectivity extraction

Ovadya Menadeva, Ram Peltinov, Roman Kris, 2003, SPIE Photomask Technology.