Jérôme Belledent

193-nm radiation durability study of MoSi binary mask and resulting lithographic performance

Martin Sczyrba, Brid Connolly, Isabelle Servin, 2011, Photomask Japan.

Characterization of inverse SRAF for active layer trenches on 45-nm node

Jean-Damien Chapon, Jérôme Belledent, Christophe Couderc, 2007, Photomask Japan.

Sensitivity of a variable threshold model toward process and modeling parameters

Kevin Lucas, Jérôme Belledent, Christophe Couderc, 2006, SPIE Photomask Technology.

Combined dose and geometry correction (DMG) for low energy multi electron beam lithography (5kV): application to the 16nm node

Jérôme Belledent, Patrick Schiavone, Luc Martin, 2012, Advanced Lithography.

3D mask modeling with oblique incidence and mask corner rounding effects for the 32nm node

Jérôme Belledent, Christophe Couderc, Isabelle Schanen, 2007, SPIE Photomask Technology.

A profile-aware resist model with variable threshold

Laurent Depre, Qian Zhao, Mu Feng, 2012, Photomask Technology.

32-nm SOC printing with double patterning, regular design, and 1.2 NA immersion scanner

Will Conley, Jérôme Belledent, Christophe Couderc, 2007, SPIE Advanced Lithography.

OPC structures for maskshops qualification for the CMOS65nm and CMOS45nm nodes

Jérôme Belledent, Christophe Couderc, Frank Sundermann, 2007, European Mask and Lithography Conference.

Contact hole shrink by directed self-assembly: Process integration and stability monitored on 300 mm pilot line

Charles Pieczulewski, Masaya Asai, Christophe Navarro, 2014 .