Kinji Yamada

High-refractive-index fluids for the next-generation ArF immersion lithography

Yong Wang, Shiro Kusumoto, Motoyuki Shima, 2006, SPIE Advanced Lithography.

High-refractive index material design for ArF immersion lithography

Mark Slezak, Takashi Miyamatsu, Katsuhiko Hieda, 2007, SPIE Advanced Lithography.

High Refractive Index Fluid for Next Generation ArF Immersion Lithography

Yong Wang, Katsuhiko Hieda, Motoyuki Shima, 2006 .