L. Sigal

High-performance circuit design for the RET-enabled 65-nm technology node

Lars W. Liebmann, Arnold Eugene Barish, Zachary Baum, 2004, SPIE Advanced Lithography.

15.5 A 1.1GHz First 64b Generation Z900 Microprocessor

L. Sigal, Howard H. Smith, Yiu-Hing Chan, 2001 .

J Warnock 22nm Next-Generation IBM System z Microprocessor ISSCC 2015 slidedeck

L. Sigal, Matthew M. Ziegler, Jeffrey A. Zitz, 2015 .

Chip integration methodology the IBM

Gregory A. Northrop, L. Sigal, Howard H. Smith, 1999 .

Layout optimization at the pinnacle of optical lithography

Lars W. Liebmann, Arnold Eugene Barish, Carlos Fonseca, 2003, SPIE Advanced Lithography.

Off-state self-heating, micro-hot-spots, and stress-induced device considerations in scaled technologies

L. Sigal, N. Zamdmer, E. Nowak, 2015, 2015 IEEE International Electron Devices Meeting (IEDM).