P. Bancken

The effect of copper design rules on inductor performance

R. Hoofman, W. van Noort, C. Detcheverry, 2003, ESSDERC '03. 33rd Conference on European Solid-State Device Research, 2003..

Impact of ion implantation statistics on V/sub T/ fluctuations in MOSFETs: comparison between decaborane and boron channel implants

P. Stolk, H. Tuinhout, F. Widdershoven, 2000, 2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104).