Kenichi Kanai

Electron beam charging of a SiO2 layer on Si: a comparison between Monte Carlo-simulated and experimental results

Jack Jau, Teruyuki Hayashi, Misako Saito, 2008, Lithography Asia.

After development inspection defectivity studies of an advanced memory device

Fei Wang, Byoung-Ho Lee, Jack Jau, 2010, Advanced Lithography.

Modelling and observations of electron beam charging of an insulator/metal bilayer and its impact on secondary electron images in defect inspection equipment.

Jack Jau, Misako Saito, Kaoru Ohya, 2010, Journal of electron microscopy.

VLSI Fault Localization Using Electron Beam Voltage Contrast Image -Novel Image Acquisition and Localization Method-

Kiyoshi Nikawa, Yasuko Hanagama, Kenji Morohashi, 1992 .