G. Hadziioannou

Study and optimization of the parameters governing the block copolymer self-assembly: toward a future integration in lithographic process

T. Chevolleau, X. Chevalier, R. Tiron, 2011, Advanced Lithography.

Improvements of self-assembly properties via homopolymer addition or block-copolymer blends

X. Chevalier, R. Tiron, C. Navarro, 2014, Advanced Lithography.

Self-assembly of Si-containing block copolymers with high-segregation strength: toward sub-10nm features in directed self-assembly

G. Cunge, X. Chevalier, R. Tiron, 2014, Advanced Lithography.

Evaluating resist degradation during reactive ion oxide etching using 193 nm model resist formulations

George G. Barclay, Claire Sourd, Damien Perret, 2006, SPIE Advanced Lithography.

7 – Imaging and Characterization of Materials by the New Scanning Probe Techniques (STM/AFM)

G. Hadziioannou, G. Hadziioannou, P.C.M. Grim, 1994 .

On interface dipole layers between C60 and Ag or Au

G. Hadziioannou, A. Heeres, G. Hadziioannou, 2002 .

Structural study of mixtures of styrene isoprene two- and three-block copolymers

G. Hadziioannou, A. Skoulios, 1982 .