Shigeki Shimomura

High-accuracy resist development process with wide margins by quick removal of reaction products

Tadahiro Ohmi, Masanobu Onodera, Hisayuki Shimada, 1994, Advanced Lithography.

High-resolution pattern formation featuring excellent dimension correlation by enhanced wettability development technology

Hisayuki Shimada, Mamoru Miyawaki, Tadahiro Ohmi, 1993, Advanced Lithography.

High-Reliability Lithography Performed by Ultrasonic and Surfactant-Added Developing System

Tadahiro Ohmi, Masanobu Onodera, Shigeki Shimomura, 1993 .

High-Sensitivity and High-Resolution Contact Hole Patterning by Enhanced-Wettability Developer

Tadahiro Ohmi, Kouichi Hirose, Hisayuki Shimada, 1993 .