An Elegant Post-Growth Process Science Protocol to Improve the Material Properties of Complex Oxide Thin Films for Tunable Device Applications
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S. Ramanathan | M. Cole | É. Ngo | C. Hubbard | S. Hirsch | R. Toonen | M. Ivill | A. Podpirka
暂无分享,去创建一个
S. Ramanathan | M. Cole | É. Ngo | C. Hubbard | S. Hirsch | R. Toonen | M. Ivill | A. Podpirka