Valence number transition and silicate formation of cerium oxide films on Si(100)
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H. Iwai | Nobuyuki Sugii | Kuniyuki Kakushima | Parhat Ahmet | Yoshinori Kataoka | Kazuo Tsutsui | Toshiyuki Hattori | Hiroshi Nohira | M. Mamatrishat | K. Natori | M. Kouda | N. Sugii | H. Nohira | A. Nishiyama | P. Ahmet | K. Kakushima | K. Natori | K. Tsutsui | Y. Kataoka | H. Iwai | A. Nishiyama | T. Hattori | M. Kouda | M. Mamatrishat
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