This paper presents a project developed in cooperation between two French Microelectronic Centres and a Microsystems Brazilian Laboratory. The goal was to design and fabricate a very simple photolithography alignment and UV exposure machine for both main purposes: pedagogical formation for initial education students and for research laboratories involved in the deposition and the growth of thin films for devices applications. The basic idea was to design a very simple equipment which does not need any specific training and can be used by students or searchers without heavy facilities such VLSI technology clean rooms and associated expensive equipments. The features and characteristics of this equipment involving a violet LED matrix as UV light source are close to industrial alignment equipment for research laboratories. The field of applications covers the prototyping of basic devices and the training for students at master level.