Investigation of a steady-state cylindrical magnetron discharge for plasma immersion treatment

Ion current distribution in a system with crossed magnetic and electrical fields for plasma immersion ion implantation has been investigated. It is found that the ion current to a target has a nonmonotonic behavior with bias voltage when a magnetic field is applied. For instance, the current density has a maximum of about 150 A/m2 at bias voltage of about 1 kV in the case of a magnetic field parallel to the target of about 0.035 T. These results are explained in terms of ionization by magnetized electrons in the E×B system. Our findings suggest that the system with crossed fields can be used for intense plasma immersed processing.

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