Ga-doping for β-FeSi2 films prepared by molecular beam epitaxy
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Zhengxin Liu | H. Tanoue | Y. Makita | T. Ootsuka | Y. Nakayama | Y. Fukuzawa | R. Kuroda | N. Otogawa | M. Osamura
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Zhengxin Liu | H. Tanoue | Y. Makita | T. Ootsuka | Y. Nakayama | Y. Fukuzawa | R. Kuroda | N. Otogawa | M. Osamura