The oxidation of (100) textured diamond

The thermal oxidation of highly textured (100) chemical vapour deposited (CVD) diamond has been investigated using a combination of high resolution X-ray photoelectron spectroscopy. The diamond samples were oxidised in dry O in a vacuum 2 furnace at temperatures up to 800 8C. The kinetics of oxidation of well-defined crystal facets of (100) diamond have been studied using in-situ laser interferometry and thermogravimetric analysis. Concomitant scanning probe microscopic examination of individual facets after oxidation revealed negligible changes to the surface roughness. Oxygen containing functional groups such as ether (COC) and carbonyl ()C_O) have been observed using X-ray photoelectron spectroscopy at all the surface coverages investigated. Even at higher coverages the formation of higher oxidation states such as carboxylic acid groupings was negligible (-2.5%). Angle resolved X-ray photoelectron spectroscopy measurements have been used to discriminate between surface and sub-surface oxygen. 2002 Elsevier Science B.V. All rights reserved.

[1]  Q. Sun,et al.  Relative oxidation behavior of chemical vapor deposited and type IIa natural diamonds , 1992 .

[2]  N. Takagi,et al.  Chemisorbed states of atomic oxygen and its replacement by atomic hydrogen on the diamond (100)-(2×1) surface , 1999 .

[3]  Jin-Cheng Zheng.  Oxygen-induced surface state on diamond (100) , 2001 .

[4]  R. E. Thomas,et al.  Activation energy and mechanism of CO desorption from (100) diamond surface , 1993 .

[5]  D. Briggs,et al.  Practical surface analysis: By auger and x-ray photoelectron spectroscopy , 1983 .

[6]  M. Seah,et al.  Practical Surface Analysis , 1992 .

[7]  John I. B. Wilson,et al.  Epitaxy of diamond on silicon , 1995 .

[8]  P. Oelhafen,et al.  Photoelectron spectroscopy study of natural (100), (110), (111) and CVD diamond surfaces , 1996 .

[9]  W. Hsu,et al.  Role of microstructure on the oxidation behavior of microwave plasma synthesized diamond and diamond-like carbon films , 1990 .

[10]  W. V. Enckevort,et al.  Oxidative etching of diamond , 2000 .

[11]  D. Briggs,et al.  High Resolution XPS of Organic Polymers: The Scienta ESCA300 Database , 1992 .

[12]  I. Drummond,et al.  Design of a UHV reactor for microwave plasma deposition of diamond films , 1994 .

[13]  John I. B. Wilson,et al.  The growth of (100) orientated diamond films , 1994 .

[14]  Q. Sun,et al.  The kinetics of chemical vapor deposited diamond-oxygen reaction , 1993 .

[15]  J. D. Paula,et al.  Studies of the manganese site of photosystem II by electron spin resonance spectroscopy , 1987 .

[16]  M. Plomp,et al.  A surface topographic investigation of {001} diamond surfaces etched in oxygen , 2000 .