Control of Nitrogen Depth Profile and Chemical Bonding State in Silicon Oxynitride Films Formed by Radical Nitridation
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Tadahiro Ohmi | Shimpei Tsujikawa | Akinobu Teramoto | Tomoyuki Suwa | T. Ohmi | M. Komura | A. Teramoto | T. Suwa | H. Umeda | S. Tsujikawa | M. Inoue | Kazumasa Kawase | Masao Inoue | Hiroshi Umeda | Akamatsu Yasuhiko | Masaaki Higuchi | Masanori Komura | K. Kawase | Y. Akamatsu | Masaaki Higuchi
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