Off-state modulation of SOI floating-body
暂无分享,去创建一个
W. Haensch | J.B. Chang | K. Jenkins | W. Haensch | K. Jenkins | J. Sleight | J.W. Sleight | J.B. Chang
[1] D. Mocuta,et al. High performance CMOS devices on SOI for 90 nm technology enhanced by RSD (raised source/drain) and thermal cycle/spacer engineering , 2003, IEEE International Electron Devices Meeting 2003.
[2] Chenming Hu,et al. On the body-source built-in potential lowering of SOI MOSFETs , 2003, IEEE Electron Device Letters.
[4] Kenneth L. Shepard,et al. Body-voltage estimation in digital PD-SOI circuits and its application to static timing analysis , 1999, 1999 IEEE/ACM International Conference on Computer-Aided Design. Digest of Technical Papers (Cat. No.99CH37051).
[5] K.A. Jenkins,et al. Measurement of I-V curves of silicon-on-insulator (SOI) MOSFET's without self-heating , 1995, IEEE Electron Device Letters.
[6] T. Chan,et al. Subbreakdown drain leakage current in MOSFET , 1987, IEEE Electron Device Letters.
[7] S. Narasimha,et al. A high performance 90nm SOI technology with 0.992 /spl mu/m2 6T-SRAM cell , 2002, Digest. International Electron Devices Meeting,.
[8] Pin Su,et al. Studying the impact of gate tunneling on dynamic behaviors of partially-depleted SOI CMOS using BSIMPD , 2002, Proceedings International Symposium on Quality Electronic Design.
[9] K. Jenkins,et al. Measurement of the effect of self-heating in strained-silicon MOSFETs , 2002, IEEE Electron Device Letters.
[10] C. Hu,et al. Modeling the floating-body effects of fully depleted, partially depleted, and body-grounded SOI MOSFETs , 2004 .
[11] L. Black,et al. Stress memorization in high-performance FDSOI devices with ultra-thin silicon channels and 25nm gate lengths , 2005, IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..