Evaluation of a new metrology technique to support the needs of accuracy, precision, speed, and sophistication in near-future lithography
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Noelle Wright | Maurits van der Schaar | Kaustuve Bhattacharyya | Jacky Huang | Chih-Ming Ke | John Lin | Andreas Fuchs | Cathy Wang | Jimmy Hu | Willie Wang | H. L. Chung | C. R. Liang | Victor Shih | H. H. Liu | Y. D. Fan | Kiwi Yuan | Vivien Wang | Mir Shahrjerdy | Karel van der Mast | H. J. Lee | Spencer Lin
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[2] Maurits van der Schaar,et al. A comprehensive look at a new metrology technique to support the needs of lithography performance in near future , 2008, Lithography Asia.