Thermal considerations for advanced SOI substrates designed for III-V/Si heterointegration
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E. Augendre | M. Urteaga | B. Brar | J. Bergman | L. Benaissa | E. A. Fitzgerald | K.J. Herrick | D. Lubyshev | M. T. Bulsara | N. Daval | N. Yang | W.K. Liu | J.M. Fastenau | Y. Wu | W. Ha | C. Drazekd | W.E. Hoke | J.R. LaRoche | T.E. Kazior | J. Fastenau | D. Lubyshev | M. Urteaga | B. Brar | E. Fitzgerald | M. Bulsara | K. Herrick | E. Augendre | T. Kazior | W. Hoke | L. Benaissa | N. Daval | J. Bergman | W. Ha | Y. Wu | W.K. Liu | J. LaRoche | N. Yang | C. Drazekd
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